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ACS Applied Engineering Materials, 24 October 2025, Volume 3, Issue 10

ACS Applied Engineering Materials, 24 October 2025, Volume 3, Issue 10

Posted on 2025/10/24

by sg_portfolio

Anodic Porous Alumina Template
Antireflection Structures
Au Electrodeposition
Etching Mask
PDMS Molds
Photocurable Monomer Absorption
Photonanoimprinting
Polydimethylsiloxane
Residual-Free Resist Patterns
Si Substrate Patterning
Vacuum Ultraviolet
VUV Light

ACS
ACS Applied Engineering Materials

Journal: ACS Applied Engineering Materials
Publisher: ACS
Article Title: Preparation of Fine Patterns without Residual Layers by Photonanoimprinting Using PDMS Molds
Authors: Takashi Yanagishita, Teppei Nariyama, Toshiaki Kondo and Hideki Masuda
Paper link: https://pubs.acs.org/doi/10.1021/acsaenm.5c00633
Journal issue link: https://pubs.acs.org/toc/aaemdr/3/10